文献检索/Journal of Hazardous MaterialsEM-T2Journal of Hazardous Materials2025-03-30第 492 卷，138060-138060高影响力 · 前 10%Dual-site Langmuir-Hinshelwood mechanism in ZnCr-LDH/NH2-UIO66 heterojunction for efficient photocatalytic NO oxidationJing GuoUniversity of Shanghai for Science and TechnologyHaotong MaUniversity of Shanghai for Science and TechnologyHuan ShangUniversity of Shanghai for Science and TechnologyWenchao WangUniversity of Hong KongRong YangUniversity of Shanghai for Science and TechnologyShuo WangUniversity of Shanghai for Science and TechnologyYingchun MiaoQujing Normal UniversityDavid Lee PhillipsUniversity of Hong KongGuisheng LiUniversity of Shanghai for Science and TechnologyShuning XiaoUniversity of Shanghai for Science and Technology去出版社页面 引用论文图谱收藏 被引提醒分享打印登录后看摘要和中文要点英文摘要、AI 生成的中文摘要和三条要点、参考文献和引证文献列表、论文图谱，注册免费。登录 / 注册关键词photocatalytic NO oxidationUiO-66-NH2metal-organic frameworksheterojunctionNO2 suppressionnitrate selectivityreactive oxygen speciesbuilt-in electric fieldcharge separationNO adsorptionair pollution control参考文献50引证文献1相似文献引文网络关联作者相关机构登录后可以看完整列表。去登录论文图谱本篇和它的参考文献、引证文献、相似文献登录后可以看这篇的论文图谱：谁被它引用、谁引用了它、还有哪些相似的研究。登录 / 注册
