Removal of antibiotic resistance genes by Cl2-UV process: Direct UV damage outweighs free radicals in effectiveness

• Jingyi ZhangHarbin Institute of Technology
• Weiguang LiHarbin Institute of Technology
• Xuhui WangHarbin Institute of Technology
• Xinran ZhangSun Yat-sen University
• Xinming GuoHarbin Institute of Technology
• Caihua BaiHarbin Institute of Technology
• Longyi LvHebei University of Technology